The calculation method of plating current density can be carried out by the following formula: I=(60ρd S)/(100Kηt), where I denotes the total current, ρ denotes the density of plated metal, d denotes the thickness of the plated layer, S denotes the total area, K denotes the electrochemical equivalent, η denotes the cathodic current efficiency, and t denotes the time.
Calculation of plating current density
Author: Robby
I=(60ρd S)/(100Kηt)
The calculation method of plating current density can be carried out by the following formula: I=(60ρd S)/(100Kηt), where I denotes the total current, ρ denotes the density of plated metal, d denotes the thickness of the plated layer, S denotes the total area, K denotes the electrochemical equivalent, η denotes the cathodic current efficiency, and t denotes the time.
The following parameters need to be known when calculating the current density:
Plated metal density (ρ): indicates the mass per unit volume in grams per cubic centimeter (g/cm³).
Plating thickness (d): indicates the thickness of the plating in micrometers (μm).
Total area (S): indicates the area to be plated in square decimeters (dm²).
Electrochemical Equivalent (K): Indicates the amount of material required per unit of charge transfer in grams-an-hour/ampere (g/(A-h)).
Cathodic current efficiency (η): indicates the ratio of actual current to theoretical current, usually expressed as a percentage.
Time (t): indicates the time of plating in minutes (min).
The specific formula can be calculated by substitution based on known parameters. For example, assuming a plating metal density of 8.92 g/cm³, a plating thickness of 10 μm, a total area of 50 dm², an electrochemical equivalent of 1.186 g/(A-h), a cathodic current efficiency of 95%, and a plating time of 30 min, the total current I can be calculated by the above formula. further, the current density can be calculated by the current density formula D = I / S.